Low resistivity ITO deposition by sputtering
Kyodo International offer sputtering service of ITO, AZO with low resistivity and high transparency applying patented technology developed by IMRE(Institute of Material Research and Engineering) in Singapore.
Low temperature process enables high quality film formation on polymer film or heat sensitive substrate/structure. Suitable for prototyping of OPV, OLED etc.
Resistivity in-plane of water
ITO
low temperature
| Thickness (nm) |
Sheet resistance (Ω/□) |
Resistance (µΩ・cm) |
Distribution (Average %) |
|---|---|---|---|
| 100 | 44.4 (±26.2%) |
450 (±15%) |
±10.4% |
| 150 | 29.6 （26.2%） |
450 (±15%) |
±10.4% |
AZO
low temperature
| Thickness (nm) |
Sheet resistance (Ω/□) |
Resistance (µΩ・cm) |
Distribution (Average %) |
|---|---|---|---|
| 100 | 300 -1500 |
3000 -15000 |
±10.2% |
| 150 | 200 -1000 |
3000 -15000 |
±10.2% |
Transparency
ITO
| Thickness (nm) | Wavelength (nm) | Transparency (%) |
|---|---|---|
| 100 | 500 | 88 |
| 150 | 500 | 88 |
AZO
| Thickness (nm) | Wavelength (nm) | Transparency (%) |
|---|---|---|
| 100 | 500 | 88 |
| 150 | 500 | 88 |
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| 製品分類1 | Deposition, Photolithography, Etching |
|---|---|
| 製品分類2 | ITO |
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