Sputtered insulation layers equivalent to CVD

We offer various sputtered insulation layers which are equivalent to the layers by CVD. SiO₂, SiN, and SiON layers with high insulating performance are fabricable by using our proprietary sputtering technology.

It is applicable to various applications such as insulation layer, passivation and so on. As it is low temperature process, it is possible to apply to heat-sensitive substrates such as substrate with photoresist, film substrate etc.

	Condition	Film thickness (nm)	Dielectric constant	Dielectric breakdown and field intensity (MV/cm)
SiO2	(1) Standard	215	3.8	11.6
	(2) For photo resist	185	4	10.7
SiN	(1) Dense	225	2	8
	(2) Standard	192.4	6.9	8.3
SiON	(1) Dense	227	4.4	13.2
	(2) Standard	190.8	13.8	9.4
SiN PE-CVD	-	216.9	6.4	8.7