Nanoimprint (NIL) Trial Mold (Stamper)

This is a standard mold pattern( mold, stamper), that has beared NIL(Nanoimprinting) or the first tests of the Imprint, in other words all kinds of experiments.

You can choose the best pattern size, which suits your needs: from nano-orders to micro-orders.

Trial Mold (1) 1 - 50µm

Trial Mold (1) 1 - 50µm
Pattern Mold Part No.
Size Depth Feature Structure Material
1~50µm 2µm L/S, Hole,
Pillar on a chip
20×20mm (t=1mm) Si DTM-1-1
5µm DTM-1-2
10µm DTM-1-3

Trial Mold (2) 0.5 - 2µm

Trial Mold (2) 0.5 - 2µm
Pattern Mold Part No.
Size Depth Feature Structure Material
0.5~2µm 1µm L/S, Hole,
Pillar on a chip
20×20mm (t=1mm) Si DTM-2-1
2µm DTM-2-2

Trial Mold (3) Nano Pattern

Pattern (1)

Nano Pattern 1

Pattern (2)

Nano Pattern 2

Pattern (3)

Nano Pattern 3
Type Pattern Mold Part No.
Size Depth Feature Area   Structure Material
Pattern (1) 50, 100,
150, 200nm
100nm L/S, Pillar, Hole, Cross,
Check, Meanders, on a chip
1.1×1.7mm
(8points)
Φ2"
(t=500µm)
Si DTM-3-1
Quartz DTM-3-2
Pattern (2) 25nm
(Half Pitch)
40nm L/S 0.4×0.4mm
(4points)
20×20mm
(t=525µm)
Si DTM-3-3
35nm
(Half Pitch)
50nm 0.5×1.2mm
(4points)
DTM-3-4
Pattern (3) 35nm
(Half Pitch)
50nm Hole (Square) 0.4×0.4mm
(4points)
15×15mm
(t=525µm)
Si DTM-3-5
45nm
(Half Pitch)
70nm 0.6×0.6mm
(4points)
DTM-3-6
Pattern (4) 125 - 150nm - 300nm L/S 30×30mm Φ4"
(t=500µm)
Si DTM-3-7
- 150nm Quartz DTM-3-8
Pattern (5) 90/250, 100/275,
120/300 nm on a chip
- 200nm 7×7mm
(3points)
Si DTM-3-9
- 100nm Quartz DTM-3-10
Pattern (6) 135/300, 175/400,
250/500,
300/600 nm on a chip
- 300nm 10×10mm
(4points)
Si DTM-3-11
- 150nm Quartz DTM-3-12

* Part of pattern might have defect by optical interference in Pattern (2) and (3).
* Please do not hesitate to contact us about more details of (5) and (6).

Trial Mold (4) Micro Lens Array

Pattern (1)

Trial Mold (4) Micro Lens Array1

Pattern (2)

Trial Mold (4) Micro Lens Array Pattern (2)

Pattern (3)

Trial Mold (4) Micro Lens Array Pattern (3)

Pattern (4)

Trial Mold (4) Micro Lens Array Pattern (4)

Pattern (5)

Trial Mold (4) Micro Lens Array Pattern (5)
Pattern Mold Part No.
Type Size Depth Area Structure Material
(1) (1) approx Φ2.2µm
(2) approx Φ1.3µm
(3) approx Φ3.8µm
(1) approx 0.32µm
(2) approx 0.12µm
(3) approx 0.85µm
5×5mm (3points) 20×20mm (t=1mm) Si DTM-4-1
(2) Φ20µm 3~4µm 60×60mm 70×70mm (t=1mm) DTM-4-2
(3) Φ15µm 2~3µm DTM-4-3
(4) Φ10µm DTM-4-4
(5) Φ9µm 5.5µm 50×50mm 70×70mm (t=300µm) Ni DTM-4-5
(6) 100×100mm 120×120mm (t=300µm) DTM-4-6

Trial Mold (5) Photonic Crystal

Pattern (1)

Trial Mold (5) Photonic Crystal Pattern 1

Pattern (2)

Trial Mold (5) Photonic Crystal Pattern 2
Type Pattern Mold Part No.
Size Depth Feature Area Pitch Structure Material
Pattern (1) A 275nm
B 225nm
C 175nm
D 125nm
100 -
300nm
Pillar
(Trigonal)
(Chamfered square)
10×10mm
(4points)
A 500nm
B 400nm
C 300nm
D 200nm
Φ2"
(t=525µm)
Si DTM-5-1
Pattern (2) Φ240nm - 300nm Hole (Square) 20×20mm 350nm Φ4"
(t=500µm)
Si DTM-5-2
- 150nm Quartz DTM-5-3
Φ260nm - 450nm Hole (Trigonal) 20×20mm 520nm Si DTM-5-4
- 200nm Quartz DTM-5-5
Φ300nm - 450nm 46×46mm 600nm Si DTM-5-6
- 200nm Quartz DTM-5-7
Φ350nm - 450nm 20×20mm 780nm Si DTM-5-8
- 200nm Quartz DTM-5-9
Φ300nm - 450nm Pillar (Trigonal) 46×46mm 600nm Si DTM-5-10
- 200nm Quartz DTM-5-11
Φ130nm - 200nm Pillar (Squar) 30×30mm 300nm Si DTM-5-12
- 100nm Quartz DTM-5-13
Φ300nm - 450nm Hole (Trigonal) Φ4">94% 600nm Si DTM-5-14
- 200nm Quartz DTM-5-15
Φ350nm - 450nm Pillar (Trigonal) 20×20mm 780nm Si DTM-5-16
- 200nm Quartz DTM-5-17
Φ400nm - 450nm Hole (Trigonal) 1500nm Si DTM-5-18
- 200nm Quartz DTM-5-19
Φ400nm-650nm - 450nm 1000nm Si DTM-5-20
- 200nm 780nm Quartz DTM-5-21
Φ400nm - 450nm Pillar (Trigonal) 1500nm Si DTM-5-22
- 200nm 1000nm Quartz DTM-5-23
Φ400nm-650nm - 450nm 1500nm Si DTM-5-24
- 200nm 1000nm Quartz DTM-5-25

 

Trial Mold (6) AR Pattern

Trial Mold  AR Pattern
Pattern Mold Reflectance Part No.
Size Depth Feature Area Structure Mateial
250nm 350nm Circular Cone 100×100mm 120×120mm(t=300µm) Ni <0.2% (500nm-) DTM-6-1
300nm 300nm 50×50mm 70×70mm(t=300µm) <0.6% (400nm-) DTM-6-2
250nm 350nm 200×200mm 250×250mm(t=300µm) <0.2% (500nm-) DTM-6-3
300nm 300nm 100×100mm 120×120mm(t=300µm) <0.6% (400nm-) DTM-6-4
500nm 700nm 80×80mm 100×100mm(t=300µm) <0.2% (900nm)
<0.3% (1500nm)
*Near Infrared
DTM-6-5

Trial Mold (7) 0.5µm Large Area

0.5µm Large Area
Pattern Mold Part No.
Size Depth Feature Area Pitch Structure Material
0.5µm 1µm L/S 50×50mm 1µm Φ4" or Φ6" (t=1mm) Si DTM-7-1
Φ0.5µm Hole (Trigonal) DTM-7-2
Pillar (Trigonal) DTM-7-3

* Please note that there is 1 - 2µm gap at pattern boundary.

Trial Mold (8) Mold for High Intensity

Mold for High Intensity
Pattern Mold Part No.
Size Depth Feature Area Pitch Structure Material
Φ230nm 200nm Hole (Trigonal) Φ120mm 460nm Φ120mm (t=775µm) Si DTM-8-1
Pillar (Trigonal) DTM-8-2

Trial Mold (9) Quartz Mold

Pattern Mold Part No.
Size Depth Feature Area Structure Material
75, 100, 150, 200nm 200nm L/S 4×4mm (4ヶ所) 20×20mm (t=850µm) Quartz DTM-9-1
75nm 150nm 24×24mm 32×34mm (t=850µm) DTM-9-2
100nm DTM-9-3
Φ350nm 350nm Pillar (Squar) DTM-9-4
Φ250nm 250nm Pillar (Trigonal) DTM-9-5
Φ160nm 350nm Moth-eye (Square) DTM-9-6
Φ200nm DTM-9-7
Φ250nm Moth-eye (Trigonal) DTM-9-8

* Please note the design is likely to be changed without prior notice.

* Please note it likely have exposure/etching defect or foreign particle in a part of mold (template).

Trial Mold (10) Diffraction Grating Mold

Trial Mold (10)	Diffraction Grating Mold
Type pattern Mold Part No.
Size Depth Area Structure Material
Linear 500nm 250nm 80 x 80mm 100 x 100 mm (t=300µm) Ni DTM-10-1
Crossed DTM-10-2

Trial Mold (11) Engineered Diffuser Mold

Trial Mold (11)	Engineered Diffuser Mold
Type Diffusion angles
(FWHM)
Pattern Mold Part No.
Area Structure Material
Linear 1°/80° 50 x 50mm 70 x 70 mm (t=300µm) Ni DTM-11-1
100 x 100mm 120 x 120 mm (t=300µm) DTM-11-2
Crossed 25° 50 x 50mm 70 x 70 mm (t=300µm) DTM-11-3
100 x 100mm 120 x 120 mm (t=300µm) DTM-11-4

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製品分類1 Nanoimprinting
製品分類2 Mold (stamper)
プロセス分類
サムネイル画像 Trial Mold for Nanoimprinting
説明文
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