Realizing Nano-Micro Order Structures
Nanoimprint Solution TEX Series $logo$

Improve functionality (efficiency, optical properties, etc.) of products and materials by fine patterning using nanoimprinting.
TEX series realizes high productivity and ease of use for R&D and volume production than the conventional photolithography method.

Features
Use cases (Applications)
Line up
Imprint process

Features

Simple configuration that does not require vacuum or pressurization
Resolution: Fabricate fine pattern structure around 100 nm
High productivity (throughput is 1-2 minutes)
Higher residual film controllability (15 nm or less) compared to conventional nanoimprint equipment
Achieves high in-plane uniformity due to excellent substrate followability

“Easy to use” nanoimprint system by integrating Master mold,
soft mold, UV resin, and imprint equipment

L/S pattern (for AR/VR)

Moth eye anti-reflective lens (Quartz)

Application in the nanowire manufacturing process
* Courtesy of Professor Kamiyama of Meijo University

Use cases (Applications)

AR, VR related
3D sensor (hologram)
Metalens
Flexible MEMS
LSPR (Localised surface plasmon resonance)
3D hologram
Improved light extraction efficiency (LED, laser)
Cell medium (medical, Lifescience)

TEX Series Line-up

Model	TEX-01	TEX-02	TEX-2.5	TEX-03
Wafer size	2” & 4”	4” & 6”	4” & 6”	4” & 6”
Through put	N/A (R&D use)	60 to 80 sec.	40 to 60 sec.	40 to 60 sec.
Imprint operation	Manual	Auto	Auto	Auto
Wafer load/unload	Manual	Manual	Auto	Auto
Cassette to Cassette transport	N/A	N/A	Applicable	Applicable
Auto mold exchange function	N/A	N/A	N/A	Applicable
Cleanroom class	Class 1000	Class 1000	Class 1000	Class 100