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All plastic versatile Spin processor "POLOS "

"POLOS®" manufactured by SPS is a spin processor with all plastic design, brushless motor equipped and many options and expandability available.

All plastic versatile Spin processor POLOS

The versatile, all plastic, POLOS® and SPIN15 single substrate spin processors are specifically designed for applications for MEMS, R&D and typically low volume applications. Spin developing, spin etching, rinse / cleaning, spin drying.

Benefits

  • Full plastic systems
    • Easy to use = It can be easily cleaned.
    • Can be used for multiple processes: etching, development, spin-dry, etc.
    • Chemical inert (Polypropylene, Teflon).
  • Use of brushless motor
    • Rotation of heavy substrates works flawlessly.
    • Acceleration/ Backwards rotation/ no rotation values settable.
    • Rotation speed up to 10000rpm. Coating with high viscosity material also possible
  • Many options and expandability available
    • availableSubstrate dimensions from chip size up to 1000×1000mm can be handled.
    • Various line-ups of choices for many applications
      * Dispense type: manual / automatic
      * Desktop type / OEM type
      * All inclusive system "Mini Wet Station"
    • Wide choice available for fixing the substrate (ex. Vacuum chuck, Mechanical chuck, etc.)
    • Many customizations available for pumps, tanks, feed back systems for external apparatus, etc.

All plastic versatile Spin processor POLOS Line-up

Basic model

  • 3 output connecters (i.e.: Dispense unit, N2 diffuser etc.)
  • Output connecter enables to be used as an Automatic dispens
Dispense  Manual
Model  Spin150x (Desktop)
Spin150x-INT (Built-in)		  Spin200x (Desktop)
Spin200x-INT (Built-in)
Substrate and Size  Up to φ160mm (or 6”) or 4”x4”  Up to φ260mm (or 8”) or 6”x6”
Applications Dry  ✔  ✔
Rinse  ✔  ✔
Cleaning  ✔  ✔
 Etching  ✔  ✔
 Development  ✔  ✔
 Coating Manual  ✔  ✔
 Coating Automatic  -  -

Advanced model

  • Infinite I/O control by LAN connection
  • High torque robust motors for heavy substrates or high speed
  • System integrated solutions available on request
Dispense  Automatic
Model  POLOS200x-ADV (Desktop)
POLOS200x-ADV-INT (Built-in)		  POLOS300x-ADV (Desktop)
POLOS300x-ADV-INT (Built-in)
Substrate and Size  Up to φ260mm(or 8”) or 6”x6”  Up to φ360mm(or 12”) or 8”x8”
Applications Dry  ✔  ✔
Rinse  ✔  ✔
Cleaning  ✔  ✔
 Etching  ✔  ✔
 Development  ✔  ✔
 Coating Manual  -  -
 Coating Automatic  ✔  ✔

＊Up to 1000mm square substrates can be applied as an option

All plastic versatile Spin processor POLOS common characteristics

 Chamber Material -NPP (Standard) or PTFE (Optional)
 A seamless chamber structure by chemical-resistant polypropylene (Teflon as an option). Easy to clean.
 Control Panel -Touch panel operation. Detachable 
 Operable with glove. Suitable for use in glove box.
 Program -Unlimited programs and storage capacity*
-Minimum step time ±0.1sec.
 External PC is unnecessary
 *USB, PC software etc. are possible by adding standard unit.
 Data Port USB 
 Included Substrate Holder -Standard Vacuum Chuck
-Small adapter forφ 1/2“- φ 2’’
 (Various holders are available optionally) 
 Rotating Speed -Up to 12000rpm (150 or 200 series)
-Up to 10000rpm (300 series)
 Clockwise, Anticlockwise, Paddle action
Acceleration  0-3000 rpm/sec 
 Rotating Accuracy ±1rpm
 Power Supply 100–120VAC, 50/60Hz, 2.5A
Power Consumption 500W (max)

All included system "Spin process station"

POLOS Mini Wet Station (MWS)
Changes of specifications without previous notices possible.

By integrating Spin processor and high accuracy chemicals supply system in one body, it is possible to set up multiple processes in a single program. Chemical sharing system, liquid disposal system and ventilation system are mounted in a cabinet with sensor-monitored alarm system, guarantees safety in operation. Spin processor applies materials (PP, PTFE, etc.) which offer the same superior chemical inertness as other models.

Feature

Substrate 300mm mm model (Can handle substrate up to Φ260mm)
Φ400mm model (Can handle substrate up to Φ360mm)
Customized Spin Processor can handle substrates up to 600mm×600mm.
Chamber Materials PP, PTFE (TFM1600), PFA, ECTFE
Motor - Standard type
 1 - 10,000rpm, clock-wise rotation, in case of φ8" substrate, acceleration is 2,000rpm/s.
- Heavy duty type
 1 - 10,000rpm, clock-wise and reverse clock-wise rotation, in case of Φ8" substrate, acceleration is 2,000rpm/s.
Selectable from above. For more information about motor types, please contact us
Main Option Linear drive chemicals delivered arm, chemicals delivery nozzle / line expansions, mega sonic cleaning.

Recirculation possible Chemical supply, ventilation system, high pressure jet, supplied chemical temperature control, spray nozzle to be attached on the back or central side ( for example, for edge bead removal etc.), various chuck (300 types such as vacuum, mechanical, backside protection etc.), Safety interlock.

＊Up to 1000mm square substrates can be applied as an option

POLOS Chucks

Vacuum chuck for small size substrates Image: for small size substrates
Mechanical chuck Image: Mechanical chuck
Mechanical chuck for squared substrates
(Mask, Crystal cells)		 Image: For squared substrates
Other vacuum chucks for different substrates shapes and sizes Image: Other vacuum chucks
Vacuum chuck for circular substrates
(Φ2" –Φ300")		 IMage: for circular substrates
For circular substrate
(Vacuum chuck + centering pin)		 IMage: For circular substrate
Mechanical chuck for squared substrates
(Φ2", Φ3", Φ4")		 Image: for squared substrates
Other mechanical chucks 
(Please ask for more information)		 Image: Other mechanical chucks

Chemical Compatibility Chart

[Reference Information]
Chamber material :NPP（Natural Poly Propylene）as a standard or PTFE as an option ✔：Usable　-：Unusable　▲：Ask before use as it may cause destruction depend on conditions

Acetic acid Formula NPP PTFE
Acetic acid C2H2O2 ✔ ✔
Acetone C3H6O ✔ ✔
α-terpineol C10H18O ✔ ✔
Ammonium hydroxide NH4OH ✔ ✔
Amyl chloride C5H11Cl - ✔
Methoxybenzene C7H8O ✔ ✔
Benzene C6H6 - ✔
Bromine Br - ▲
Chlorobenzene C6H5OI ✔ ✔
Chloroform CHCl3 ✔ ✔
Diethyl ketone C5H10O ✔ ✔
Dimethyl malonate C11H20O4 ✔ ✔
Ethylene glycol C2H6O2 ✔ ✔
Cyclohexane C6H12 - ✔
Cyclohexanone C6H10O - ✔
Fluorine F2 - -
Hexamethyldisilazane C6H19NSi2 ✔ ✔
Hexane C6H14 ✔ ✔
Oxalic acid HBr ▲ ▲
Hydrochloric acid HCI ▲ ▲
Hydrofluoric acid HF ▲ ▲
Hydrogen peroxide solution H2O2 ✔ ✔
Iodine I2 ✔ ✔
Isopropyl alcohol (IPA) C3H8O ✔ ✔
Trimethylbenzene C9H12 ✔ ✔
Ozone water O3 ＆ H2O ✔ ✔
Methanol CH4O ✔ ✔
Methyl ethyl ketone (MEK) C4H8O ✔ ✔
Methylene chloride CH2CI2 ✔ ✔
Methyl isobutyl ketone (MIK) C6H12O ✔ ✔
N-Methyl-2-Pyrolidone (NMP) C5H9NO3 ✔ ✔
Nitric acid HNO3 ▲ ✔
Phosphoric acid H3O4P ✔ ✔
Photoresist - ✔ ✔
Polymethylmethacrylate (PMMA) C5H8O2 ✔ ✔
Potassium hydrate KOH ✔ ✔
Sulfuric acid H2SO4 ▲ ▲
Tetra hydro furane (THF) C4H8O ✔ ✔
Toluene C7H8 ✔ ✔
Trichloroethane (TCA) C2H3CI3 ✔ ✔
Trichlorethylene (TCE) C2HCI3 ✔ ✔
Xylene C12H15O6 ✔ ✔

Related product

Desktop Hotplate

A precision hotplate which is suitable for pre-bake and post-bake. Table top size. Customizable. Manufactured by SPS

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製品分類1 Microfabrication Tools
製品分類2 Spin Processor
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