All plastic versatile Spin processor

All plastic versatile Spin processor "POLOS "

"POLOS™" manufactured by SPS is a spin processor with all plastic design, brushless motor equipped and many options and expandability available.

All plastic versatile Spin processor POLOS

The versatile, all plastic, POLOS™ and SPIN150™ single substrate spin processors are specifically designed for applications for MEMS, R&D and typically low volume applications. Spin developing, spin etching, rinse / cleaning, spin drying.

Benefits

  • Full plastic systems;
    • Easy to use = It can be easily cleaned.
    • Can be used for multiple processes: etching, development, spin-dry, etc.
    • Chemical inert (Polypropylene, Teflon).
  • Use of brushless motor
    • Rotation of heavy substrates works flawlessly.
    • Acceleration/ Backwards rotation/ no rotation values settable.
    • Rotation speed up to 10000rpm. Coating with high viscosity material also possible
  • Many options and expandability available
    • availableSubstrate dimensions from chip size up to 1000×1000mm can be handled.
    • Various line-ups of choices for many applications
      * Dispense type: manual / automatic
      * Desktop type / OEM type
      * All inclusive system "Mini Wet Station"
    • Wide choice available for fixing the substrate (ex. Vacuum chuck, Mechanical chuck, etc.)
    • Many customizations available for pumps, tanks, feed back systems for external apparatus, etc.
All plastic versatile Spin processor

All plastic versatile Spin processor POLOS Line-up

  Specifications Applications
  Model Description Substrate and Size Dry Rinse Cleaning Etching Development Coating
Manual
Coating
Automatic
Manual Spin150i Desktop

Spin150i
-INT Built-in
Basic model

-3 output connecters (i.e.: Dispense unit, N2 diffuser etc.)

-Output connecter enables to be used as an Automatic dispens
Up to φ160mm (or 6”) or 4”x4” -
Manual Spin200i Desktop

Spin200i-INT Built-in
Basic model

-3 output connecters (i.e.: Dispense unit, N2 diffuser etc.)

-Output connecter enables to be used as an Automatic dispens

Up to φ260mm (or 8”) or 6”x6” -
Automatic POLOS200i-ADV Desktop

POLOS200i-ADV-INT Built-in
Advanced model

-Infinite I/O control by LAN connection

-High torque robust motors for heavy substrates or high speed

-System integrated solutions available on request
Up to φ260mm(or 8”) or 6”x6” -
Automatic POLOS300i-ADV Desktop

POLOS300i-ADV-INT Built-in

Advanced model

-Infinite I/O control by LAN connection

-High torque robust motors for heavy substrates or high speed

-System integrated solutions available on request

Up to φ360mm(or 12”) or 8”x8” -

*Up to 1000mm square substrates can be applied as an option

All plastic versatile Spin processor POLOS common characteristics

 Chamber Material -NPP (Standard) or PTFE (Optional)
 A seamless chamber structure by chemical-resistant polypropylene (Teflon as an option). Easy to clean.
 Control Panel -Touch panel operation. Detachable 
 Operable with glove. Suitable for use in glove box.
 Program -Unlimited programs and storage capacity*
-Minimum step time ±0.1sec.
 External PC is unnecessary
 *USB, PC software etc. are possible by adding standard unit.
 Data Port USB 
 Included Substrate Holder -Standard Vacuum Chuck
-Small adapter forφ 1/2“- φ 2’’
 (Various holders are available optionally) 
 Rotating Speed -Up to 12000rpm (150 or 200 series)
-Up to 10000rpm (300 series)
 Clockwise, Anticlockwise, Paddle action
Acceleration  0-3000 rpm/sec 
 Rotating Accuracy ±1rpm
 Power Supply 100–120VAC, 50/60Hz, 2.5A
Power Consumption 500W (max)

All included system "Mini Wet Station"

POLOS Mini Wet Station (MWS)
Changes of specifications without previous notices possible.

By integrating Spin processor and high accuracy chemicals supply system in one body, it is possible to set up multiple processes in a single program. Chemical sharing system, liquid disposal system and ventilation system are mounted in a cabinet with sensor-monitored alarm system, guarantees safety in operation. Spin processor applies materials (PP, PTFE, etc.) which offer the same superior chemical inertness as other models.

Feature

Substrate 300mm mm model (Can handle substrate up to Φ260mm)
Φ400mm model (Can handle substrate up to Φ360mm)
Customized Spin Processor can handle substrates up to 600mm×600mm.
Chamber Materials PP, PTFE (TFM1600), PFA, ECTFE
Motor - Standard type
 1 - 10,000rpm, clock-wise rotation, in case of φ8" substrate, acceleration is 2,000rpm/s.
- Heavy duty type
 1 - 10,000rpm, clock-wise and reverse clock-wise rotation, in case of Φ8" substrate, acceleration is 2,000rpm/s.
Selectable from above. For more information about motor types, please contact us
Main Option Linear drive chemicals delivered arm, chemicals delivery nozzle / line expansions, mega sonic cleaning.

Recirculation possible Chemical supply, ventilation system, high pressure jet, supplied chemical temperature control, spray nozzle to be attached on the back or central side ( for example, for edge bead removal etc.), various chuck (300 types such as vacuum, mechanical, backside protection etc.), Safety interlock.

*Up to 1000mm square substrates can be applied as an option

POLOS Chucks

Vacuum chuck for small size substrates Image: for small size substrates
Mechanical chuck Image: Mechanical chuck
Mechanical chuck for squared substrates
(Mask, Crystal cells)
Image: For squared substrates
Other vacuum chucks for different substrates shapes and sizes Image: Other vacuum chucks
Vacuum chuck for circular substrates
(Φ2" –Φ300")
IMage: for circular substrates
For circular substrate
(Vacuum chuck + centering pin)
IMage: For circular substrate
Mechanical chuck for squared substrates
(Φ2", Φ3", Φ4")
Image:  for squared substrates
Other mechanical chucks 
(Please ask for more information)
Image: Other mechanical chucks

Chemical Compatibility Chart

[Reference Information]
Chamber material :NPP(Natural Poly Propylene)as a standard or PTFE as an option ◯:Usable -:Unusable ▲:Ask before use as it may cause destruction depend on conditions

Acetic acid Formula NPP PTFE
Acetic acid C2H2O2
Acetone C3H6O
α-terpineol C10H18O
Ammonium hydroxide NH4OH
Amyl chloride C5H11Cl -
Methoxybenzene C7H8O
Benzene C6H6 -
Bromine Br -
Chlorobenzene C6H5OI
Chloroform CHCl3
Diethyl ketone C5H10O
Dimethyl malonate C11H20O4
Ethylene glycol C2H6O2
Cyclohexane C6H12 -
Cyclohexanone C6H10O -
Fluorine F2 - -
Hexamethyldisilazane C6H19NSi2
Hexane C6H14
Oxalic acid HBr
Hydrochloric acid HCI
Hydrofluoric acid HF
Hydrogen peroxide solution H2O2
Iodine I2
Isopropyl alcohol (IPA) C3H8O
Trimethylbenzene C9H12
Ozone water O3 & H2O
Methanol CH4O
Methyl ethyl ketone (MEK) C4H8O
Methylene chloride CH2CI2
Methyl isobutyl ketone (MIK) C6H12O
N-Methyl-2-Pyrolidone (NMP) C5H9NO3
Nitric acid HNO3
Phosphoric acid H3O4P
Photoresist -
Polymethylmethacrylate (PMMA) C5H8O2
Potassium hydrate KOH
Sulfuric acid H2SO4
Tetra hydro furane (THF) C4H8O
Toluene C7H8
Trichloroethane (TCA) C2H3CI3
Trichlorethylene (TCE) C2HCI3
Xylene C12H15O6

Related product

Desktop Hotplate

A precision hotplate which is suitable for pre-bake and post-bake. Table top size. Customizable. Manufactured by SPS

  • MEMS
  • IC
  • PV
  • BIO

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製品分類1 Microfabrication Tools
製品分類2 Spin Processor
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