Mask Aligners
Mask Aligners, UV Exposure Systems, UV Light Sources, UV power meter
About OAI
OAI is a Silicon Valley-based manufacturer of advanced precision equipment for the Solar, Photovoltaic, Semiconductor, MEMS, Microfluidics, and Nanoimprinting industries, with over 40 years of experience. The cost-effective and technically verified solutions are the hallmark of the OAI brand.
OAI understands that there is a critical difference between selling just equipment and offering a high-level functional solution for the customer’s unique requirements. With this distinction in mind, the OAI has built its reputation by forming ongoing, collaborative customer relationships––the length of some is measured in decades. More than 1000 units of OAI systems are in use around the world.
Based upon its expertise in producing equipment, OAI has developed a time-tested platform of modularized subsystems, which can be adapted to become the core of a custom configured system. This approach controls cost, improves reliability, increases system flexibility, and ultimately reduces the overall cost of ownership.
We invite you to contact an OAI Solutions Engineer today and learn how we can solve your toughest manufacturing challenge efficiently and economically. From R&D tools to total production solutions, OAI will partner with your team every step of the way.
The company offers a broad portfolio of field-proven products that include Mask Aligners, UV Exposure Systems, UV Light Sources, and UV Power Meters.
Bebefits
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Wide range of equipment from the compact tabletop system for R&D to semi/full automatic system for volume production.
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Light source system is available independently.
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Based upon its expertise in producing equipment, OAI can supply cost-effective, reliable, and expandable systems by assembling modularized subsystems with a time-tested and verified platform.
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Applications in semiconductor lithography, microfluidics, nanoimprinting, MEMS, UV curing, Biotech, solar cell and resistivity evaluation, and so on.
Mask Aligner
- A Mask aligner is a machine to transcribe a fine pattern on a substrate using UV light. Substrates are made of various materials, silicon, glass, ceramic, GaAs, quartz, etc. It is used in the manufacturing of semiconductor devices, such as general transistors and Integrated circuits, and also used for LCD glass patterns and quartz crystal units as well.
- OAI mask aligner is utilized for both R&D and production around the world. The OAI systems are garnering immense praise for their reliability, durability, and technical superiority, and cost-effective performance.
- OAI mask aligners have the option to be upgraded with the function of ‘ microfluidics fabrication’ or ‘UV nano imprinting’ by adding controllers and chucks.
- Suitable applications are semiconductor, display, MEMS, microfluidics, medical/bio, and solar cells
Mask Aligner Lineup
| Model | Type | Application | Type of Alignment | Substrate Size | Operating Mode |
|---|---|---|---|---|---|
| Model200 | Manual single-side aligner | R&D | Single side | Up to Φ8" | Manual |
| Model212 | Manual single-side aligner | R&D | Single side | Up to 12”sq | Manual |
| Model800E | Semi-auto double-side aligner | R&D | Optical double-side | 8”sq | Semi-auto |
| Model6000 | Full-auto mask aligner | Production | Optical double-side | Up to Φ12" or 12"sq | Automatic |
| Model6020 | Aligner for large size format | Production | Optical double-side | 12”sq to 20”sq | Automatic |
| Model2000 | Edge-bead exposure system | Production | Single side | Up to Φ8" | Automatic |
Model 200: Manual single-side table-top mask aligner for R&D
Model 200 table-top mask aligner is a cost-effective system intended for R&D, universities, and start-ups.
| Model | 200 |
|---|---|
| Substrate | Up to 8" square |
| Mask | Up to 9" square |
| Alignment Stage control | XY movement : ±10mm Z movement : 1500µm Rotation : ± 3.5° |
| Alignment Tolerance | - |
| Exposure Shutter time | 00.1s-99.0s (0.1sec increment）or 1s-999s (1sec increment) |
| Exposure Mode : Resolution | Proximity : 5µm (20µm gap) Soft contact : 2µm Hard contact : 1µm Vacuum contact : sub-µm |
| Thoroughput | - |
| Ulitilities | Power :110V or 220V (depend on specs) Vacuum line, Air line or N2 line, Exhaust line |
| Size | 940mmH x 788mmW x 635mmD |
Model 212: Manual single-side table-top large area mask aligner for R&D
A benchtop mask aligner for R&D that is suitable to middle-size substrates up to maximize 12-inch square.
| Model | 212 |
|---|---|
| Substrate Avaialble size | Up to 12” square |
| Mask Avaialble size | Up to 14” square |
| Alignment Stage control | XY movement : ±10mm Z movement : 5mm Rotation : ± 3.5° |
| Alignment Tolerance | - |
| Exposure Shutter time | 0.1s-99.0s (0.1sec increment) or 1s to 999s (1sec increment) |
| Exposure Mode : Resolution | Proximity : 5µm (20µm gap) Soft contact : 2µm Hard contact : 1µm Vacuum contact : sub-µm |
| Thoroughput | - |
| Ulitilities | Power : 110V or 220V (or other according to Power Supply requirements and Country) Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1067mmH×1524mmW×1346mmD |
Model 800E: Semi-auto double-side mask aligner for R&D or light production
The model 800E has a double-side semi-auto alignment feature which consists of an optical system mounted on hard packages platform. It is possible to leave the operation to this machine, which works with semi-auto mode.
This type is suitable for production besides R&D and can be either topside or bottom side.
| Model | 800E |
|---|---|
| Substrate Avaialble size | Up to 8" square |
| Mask Avaialble size | Up to 9" square |
| Alignment Stage control | XY movement : ±5mm Rotation : ±4° |
| Alignment Tolerance | Single side : 0.5 to 1µm Double side: <2µm (3σ) |
| Exposure Shutter time | 1s to 3200s (0.1sec increment) |
| Exposure Mode : Resolution | Proximity：3-5μm with 15-20μm gap Soft contact : 2µm Hard contact : 1µm Vacuum contact : sub-µm |
| Thoroughput | - |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1810mmH×1270mmW×912mmD |
Model 6000: Fully Automated Mask Aligner for Production
The Model 6000 is a fully automatic computer-controlled mask aligner with optical double-side proximity contact exposure capability. Through-put is 180 wafers per hour. This type is suitable for semiconductor/MEMS production lines. Good cost performance shows from R&D to middle-volume production on the small and medium enterprises as well as large cooperation.
| Model | 6000 |
|---|---|
| Substrate Avaialble size | 50mm to 200mm wafer/square or 200mm to 300mm wafer/square 100um to 7mm thickness up to 7mm to 10mm bent |
| Mask Avaialble size | - |
| Alignment Stage control | XY movement : ±6.5mm Z movement : 1500µm Rotation : ±5° |
| Alignment Tolerance | Single side : 0.5µm (3σ) Double side : 1µm |
| Exposure Shutter time |
1s to 999s (0.1sec increment) |
| Exposure Mode : Resolution | Proximity : 3µm(20µm gap) Soft contact : 1 tp 3µm Hard contact : 0.8 to 1µm Vacuum contact : 0.5 to 0.8µm |
| Thoroughput | 180 wafers/hour (1st mask) |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1651mH x 2184mmW x 1364mmD |
Model 6020: Automated Mask Aligner for large-size format for Production
Model 6020 is a mask aligner and exposure system intended for a large-size format. It is suitable for processing FPD and other large substrates (max. 20"×20").
| Model | 6020 |
|---|---|
| Substrate Avaialble size | Up to 12” square to 20” square |
| Mask Avaialble size | Up to 14” square to 24” square |
| Alignment Stage control | Z movement : 1500μm |
| Alignment Tolerance | Single side : 0.5μm Double side ： 1μm |
| Exposure Shutter time | 1s to 999s (0.1sec increment) |
| Exposure Mode | Proximity : 5µm Soft contact : 3 to 5µm Hard contact : 2 to 3µm Vacuum contact : <2µm |
| Thoroughput | - |
| Ulitilities | Power : 400V or 208V. 3P 5 wire Vacuum line, Air line or N2 line, Exhaust line |
| Size | 71530mmH×76825mmW×36290mmD |
Model2000 : Edge-bead exposure system for Production
Model 2000 enables floodlighting exposure and edge bead exposure and is a fully automatic computer controlled system. It’s shadow mask technology makes production easy in case edge bead removal process is substantial.
| Model | 2000 |
|---|---|
| Substrate Avaialble size |
Up to12" square |
| Mask Avaialble size |
- |
| Alignment Stage control |
- |
| Alignment Tolerance |
- |
| Exposure Shutter time |
0.1s to 999s (0.1sec increment) |
| Exposure Mode : Resolution |
- |
| Thoroughput | - |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1727mH x 1041mmW x 914mmD |
UV Light Source
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A UV light source is the light source/ramp which illuminates with a specified UV wavelength. OAI’s Collimated UV Light Sources and UV Exposure Systems are available with Near, Mid, and Deep UV spectral outputs.
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As a leader in the production of stand-alone UV Light Sources, OAI has used its years of optical technology experience to produce the highest quality mirror, lens coatings, uniformity, and design.
As a result, each UV Light Source is certified to meet the most demanding specifications. Additionally, the OAI UV Light Source is a module that can be integrated at a later date onto any OAI mask Aligner significantly reducing your future Mask Aligner cost. Use an OAI UV Power and Energy Meter to measure the intensity and uniformity of the UV light source.
OAI UV Light Sources
| Model | Type | Beam size | output spectra range | output power range | shutter timer range | |
|---|---|---|---|---|---|---|
| Model 30 | UV light source | 2" - 12" | 220-450nm | 200-5kW | 0.1-999s | Standard type |
| Model 30E | Enhanced UV light source | 2" - 12" | 220-450nm | 200-5kW | 0.1-999s | With a pull-out drawer with a rotating chuck |
| Model 30 Grande | Large area collimated UV light source | 12" - 1m | 220-450nm | 200-5kW | 0.1-999s | Larger scale applications |
UV LED Light Source
UV LED Light Source is Collimated & Uniform for Demanding Lithography Application.
UV LED Light Source have the following features
- Beam size 4” to 12” sg.
- Wavelength 365um, 405um or dual-wavelength
- Dual Wavelength Tuning available
- Beam uniformity better than +/- 4%
- Beam intensity up to ~25mW/cm2
- Easy to use touch screen interface
- Collimation angle <= 2 degrees
- Dose control and timed exposure
- USB remote interface for PC control
- Long working distance
UV light source Series 30: A Standalone type
Series30 is highly efficient light source intended for various applications. Multiple and suitable beam-size can be chosen by being capable of mounting various lamps.
UV Energy and power meters
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A UV power meter measures the intensity of UV lights. The power meters, radiometer, and energy analyzers are chosen according to measurement parameters.
- OAI UV meters have the following features.
・RoHS and CE Compliant
・Detachable single or dual wavelength probes
・Auto ranging, digital display
・Light intensity measured in milliwatts/cm2
・Accuracy is traceable to NIST
・High speed serial port for data logging
UV Light Line-Up
UV Light Meters
| model | Spectral response | Intensity range |
|---|---|---|
| Model659 | 365nm – 436nm | 0 - 7500mW/cm2 |
Model 659 UV Energy Analyzer
It is a handy type UV light meter including a touch screen and a USB interface. It makes possible to measure wide range of wave length mainly used in stepper application by using with special probes(365nm, 400nm, 420nm, and 436nm).
| Model | 659 |
|---|---|
| Power | Battery operated with rechargeable 3.7V Lithium Ion with charge protection） |
| Memory storage | Up to 400 reading |
| Intensity range | Up to 7500mW/cm2 |
| Intensity resolution | 0.01mW/cm2 |
| Dose range | Up to 1000J/cm3 |
| Dose resolution | 0.01mJ/cm3 |
| Time range | Up yo 9999s |
| Time resolution | 0.0001s |
| Minimum dose exposure | 25ms |
| Size | 210mmH×90mmW×355mmD |
| Weight | 1.6kg |
| Other | Touch screen, USB, ROHS2, CE（EMS & safety） |
Calibration Services
For over 45 years, OAI is the leader in NIST traceable calibration of instruments for measuring Ultra Violet (UV) light. Originally designed to meet the demanding needs of the semiconductor wafer fabrication industry, OAI developed the most repeatable NIST traceable calibration in the industry. Today, virtually every semiconductor wafer manufacturing facility in the United States and a significant number around the world use OAI as the standard instrumentation for UV light measurement. In addition to offering the guaranteed calibration accuracy described above, OAI strives for an efficient quick calibration turnaround for users of its services.
Kyodo international Inc. is the authorized distributor of OAI.
It enables simplification of the trading business procedure on this calibration service.
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| 製品分類1 | Microfabrication Tools |
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| 製品分類2 | Mask aligner |
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