Gray Scale Mask: 3D Photolithography Processing

Micro lens array of high accuracy is produced by using gray mask.
We offer all kinds of service: from design production of the gray scale mask to
production of micro lens array.

Micro Lens Array

Lens pitch: ±1.5%
Lens SAG volume: ±1.5nm

• Lens array pitch: 10 to 1000µm
• Lens SAG volume: 5 to 100µm
• Lens accuracy: Curvature Accuracy: ±1.5%　Form Accuracy: ±1.5nm
• Lens array area: up to 140mmΦ
• Lens array material: Quartz, Silicon, Resist, Metal (Electroforming)

Gray Scale Mask

Area with low
transmissivity

Area with high
transmissivity

• Transmissivity range: 5 to 75%
• Transmissivity gradation: less than 0.1% /Gradation possible
• Mask base plate's size: 2 to 8 inch
• Mask base plate's thickness: 2 to 10 mm

It is possible to start machining from different steps of the process.
Please, do not hesitate to ask us, if you have inquiries, regarding specification details.

Wafer Process Foundry

• Wafer Process Foundry TOP
• Service Overview

Substrate

• Substrate
• Test Wafers/Various substrates

Thin Film Deposition Service

• Thin Film deposition
• Sputtering machines specifications
• Sputtering Target Stock List
• Analysis service
• CVD Performance List
• Data : Insulator film characteristics
• Data : Transmittance of sputtered ITO film
• Backside electrode deposition for Power device
• ITO/AZO deposition by low temp PVD
• Thin film fabrication for Lithium-ion rechargeable battery

Etching Processing Service

• Photolithography/Etching
• Etching machines specifications
• 3D Patterning by Gray Scale Mask

CMP Processing Service

• CMP Processing

ISAE160

KYODO INTERNATIONAL INC.

2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan

TEL)+81-044-852-7575 (Did)
FAX)+81-044-854-1979