Precision Cleaning Service

We realized an extremely environment-friendly cleaning method.
We receive orders and take care of everything up to the shipping.

Semiconductor and FPD production processing is progressing every single day and the needs for better quality grow constantly. Our Dry Ice System has received a patent for its originality patent No.3030287

In addition to cleaning by dry ice blast (CO₂), we are able to apply precision cleaning by sandblasting, chemical solution, calcination, DI water etc. depend on type of contamination. Also detoxifying treatment of toxic material is available.

From receiving the parts for delivery up to shipping

Estimate
Usage process (Ion Implant,sputter, CVD,etching,etc)
Name of machine
Way of blasting (gas)
The more information we are given, the better estimate we can make If we do not have experience with the certain material, we start from test cleaning and prepare the most suitable cleaning recipe.
Delivery date : Around 1 week

No.1 : Cleaning parts with thin holes

Photo : Cleaning method, used for electrode having aluminium anodized coat

(Cleaning method,used for electrode having Aluminium anodized coat)
The 0.3mm pellet in the dry ice powder brings much better cleaning results!

(Before cleaning)

(After cleaning)

No.2 : Initial cleaningClose Up!

Initial Cleaning method

We clean the surface of the new parts and we reduce the particles, which appear during the beginning of the change of parts.
In the sub-micron generation, in order to achieve low number of particles, initial cleaning is demanded!

Image : Graph of Comparison for particle per wafer between conventioinal method and dry ice (CO2) cleaning

Cleaning method	Material
Cleaning method	Al₂O₃ Bulk	Y₂O₃ Thermal spray
Not cleaned yet The red circles are particles!
After chemical cleaning Reduction results, already visible
After Dry Ice Cleaning Smooth surface! No existence of particles!