- KYODO INTERNATIONAL INC./Japan
- Electronics MEMS
- MEMS Total Solution
- MEMS Development Tools
MEMS Development Tools
Kyodo International propose superior MEMS development tools suitable for R&D,
prototyping to middle-scale production.
Coater, Developer
Single wafer Multi-purpose Spin Processor
«Product features»
(1) Full plastic systems;- Easy to use = It can be easily cleaned.
- Can be used for multiple processes: etching, development, spin-dry, etc.
- Chemical inert (Polypropylene, Teflon).
- Rotation of heavy substrates works flawlessly.
- Acceleration/ Backwards rotation/ no rotation values settable.
- Rotation speed up to 10000rpm. Coating with high viscosity material also possible.
- Substrate dimensions from chip size up to 1000×1000mm can be handled.
- Various line-ups of choices for many applications
* Dispense type: manual / automatic
* Desktop type / OEM type.
* All inclusive system "Mini Wet Station" - Wide choice available for fixing the substrate (ex. Vacuum chuck, Mechanical chuck, etc.)
- Many customizations available for pumps, tanks, feed back systems for external apparatus, etc.
Pre-bake, Post-bake
“POLOS” hot plate
For Pre-bake, Post-bake, Curing etc. Applicable for various wafers
Expandable for your application
Proximity chuck / Vacuum chuck / Lift pin type
Customizable to mount multiple heaters.
| Temperature control (standard spec) |
50℃ - 250℃ |
|---|---|
| Superior uniformity of temperature |
±0.5℃ |
| Timer setting | 1 - 999sec. |
| Designed for ease of maintenance | |
Photolithography
UV Exposure System for MEMS
OAI UV exposure system has a reputation of offering the highest technical quality.
«Product features»
(1) Various line-ups of systems from the Lab-oriented ones to the middle-scale.
<Typical systems for R&D>
Mask aligner Model 200
Mask aligner Model 800
Product Line-up »
<Typical systems for R&D>
Mask aligner Model 200
Mask aligner Model 800
(2) Light sources
UV Light source Series 30
Product Line-up »
UV Light source Series 30
(3) Upgrade function (microfluidics chip fabrication, UV nanoimprint, etc.) by simply adding options (Controllers, Chucks)
Download document about NIL option (PDF 6.68MB)
Solar Simulator
OAI’s solar simulator is a system which enables measurement of
photovoltaic energy conversion efficiency under the same condition.
- OAI boast more than 35 years expertise in light source and its application.
- Reasonable and customizable.
- Up to 24"×24" area coverage.
- Constant intensity
! - Time series intensity variation
! - Spectrum accordance
!
Wet etching
Wafer / Substrate Holder for MEMS Processing
Completely etchant protects backside of substrate
- Complete absorption of substrate by vacuum (low resist design).
- Eliminates backside coating process and mask.
- Reduce process and material cost. Achieve better yield.
- Applicable for various substrates.
IR inspection
IR inspector “MEMSCAN”
- Nondestructive measurement of air gap, membrane thickness etc.
- Enables thickness measurement per each layer in multi layered structure.
- High throughput performance enables prototyping to volume production.







