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  5. Single water Multi-purpose Spin Processor Line-up

Single water Multi-purpose Spin Processor Line-up

Polos_logo
MCD
(Manual dispense type)		 SPIN150 POLOS MCD 200/300 (Desktop Type) POLOS MCD 200/300 (in-Deck Type)
ACD
(Automatic dispense type)		 POLOS ACD 200/300
All included system POLOS Mini Wet Station (MWS)
POLOS Substrate Holders Chemical Compatibility Chart Usage example

MCD(Manual dispense type)

SPIN 150

Configuration Desktop type with keyboard
Main Body Chamber NPP (standard) or PTFE (option)
Inner walls
of the lid		 With protection for the shatter resistance of liquid
Lid Transparent glass with Φ19mm hole in the center
Holder See below
Substrate From chip size up to Φ6"
RPM 1 – 6,000rpm
(as option, up to 10,000rpm, in case of non-vacuum chuck : up to 3,000rpm)
Acceleration 0 – 3,000rpm/ sec
Accuracy
of rotation		 ±1rpm
Power 100 – 120VAC, 50/60Hz, 2.5A
Power
consumption		 500W (max)
Control Part Sequence Memory up to 20 programs
Program : 99step/program
Step time : 999sec/ step
Interlock Void attachment lid
Opening and shutting
POLOS MCD SPIN 150
Changes of specifications
without previous notices possible.
Option
Driving system High speed motor
Chuck type Vacuum chuck, Vacuum chuck + pins attached, for chip, available for each size.
Others Centering tool for every size
* Customizable for wet bench is available.
For details about customizations, please ask.
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POLOS MCD 200 / 300 (Desktop Type)

Configuration Desktop type with keyboard
Main Body Chamber NPP (standard) or PTFE (option)
Inner walls
of the lid		 With protection for the shatter resistance of liquid
Lid 1Transparent glass with Φ19mm hole in the center
Holder See below
Substrate From chip size up to Φ12"
RPM 1 – 6,000rpm
(as option, up to 10,000rpm, in case of non-vacuum chuck : up to 3,000rpm)
Acceleration 0 – 3,000rpm/ sec
Accuracy
of rotation		 ±1rpm
Power 100 – 120VAC, 50/60Hz, 2.5A
Power
consumption		 500W (max)
Control Part Sequence Memory up to 50 programs
Program : 99step/program
Step time : 999sec/ step
Interlock Void attachment lid
Opening and shutting
POLOS MCD 200 / 300 (Desktop Type)
Changes of specifications
without previous notices possible.
Option
Driving system High speed motor
Main body Teflon available
Chuck type Vacuum chuck, Vacuum chuck + pins attached, for chip, available for each size.
Others Centering tool for every size
* Embedded OEM model available. Customizable for wet bench is available.
For details about customizations, please ask.
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POLOS MCD 200 / 300 (POLOS OEM in-Deck Type)

Configuration Embedded OEM model
Main Body Chamber NPP (standard) or PTFE (option)
Inner walls
of the lid		 With protection for the shatter resistance of liquid
Lid Transparent glass with Φ19mm hole in the center
Holder See below
Substrate From chip size up to Φ12"
RPM 1 – 6,000rpm
(as option, up to 10,000rpm, in case of non-vacuum chuck : up to 3,000rpm)
Acceleration 0 – 2,000rpm/ sec
Accuracy
of rotation		 ±1rpm
Power 100 – 120VAC, 50/60Hz, 2.5A
Power
consumption		 500W (max)
Control Part Sequence Memory up to 20 programs
Program : 99step/program
Step time : 999sec/ step
Interlock Void attachment lid
Opening and shutting
POLOS MCD 200 / 300 (POLOS OEM in-Deck Type)
Changes of specifications
without previous notices possible.
Option
Driving system High speed motor
Main body Teflon available
Chuck type Vacuum chuck, Vacuum chuck + pins attached, for chip, available for each size.
Others Centering tool for every size
* Embedded OEM model available. Customizable for wet bench is available.
For details about customizations, please ask.
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ACD (Automatic dispense type)

POLOS ACD 200/300

Configuration Desktop type with keyboard
Main Body Chamber NPP (standard) or PTFE (option)
Inner walls
of the lid		 With protection for the shatter resistance of liquid
Lid Transparent glass with Φ19mm hole in the center
Holder See below
Substrate From chip size up to Φ12"
RPM 1 – 6,000rpm
(as option, up to 10,000rpm, in case of non-vacuum chuck : up to 3,000rpm)
Acceleration 0 – 3,000rpm/ sec
Accuracy
of rotation		 ±1rpm
Power 100 – 120VAC, 50/60Hz, 2.5A
Power
consumption		 500W (max)
Control Part Sequence Memory up to 20 programs
Program : 99step/program
Step time : 999sec/ step
Dispense valve control : 6 channels
Interlock Void attachment lid
Opening and shutting
POLOS ACD
Changes of specifications
without previous notices possible.
Option
Driving system High speed motor
Main body Teflon available
Chuck type Vacuum chuck, Vacuum chuck + pins attached, for chip, available for each size.
Others Centering tool for every size
* Available for Φ300mm substrate.
* Embedded OEM model available. Customizable for wet bench is available.
For details about customizations, please ask.
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All included system "Mini Wet Station"

POLOS Mini Wet Station (MWS)

POLOS Mini Wet Station (MWS)
Changes of specifications without previous notices possible.

By integrating Spin processor and high accuracy chemicals supply system in one body, it is possible to set up multiple processes in a single program.
Chemical sharing system, liquid disposal system and ventilation system are mounted in a cabinet with sensor-monitored alarm system, guarantees safety in operation.
Spin processor applies materials (PP, PTFE, etc.) which offer the same superior chemical inertness as other models.

Substrate Φ300mm mm model (Can handle substrate up to Φ260mm)
Φ400mm model (Can handle substrate up to Φ360mm)
Customized Spin Processor can handle substrates up to 600mm×600mm.
Chamber Materials PP, PTFE (TFM1600), PFA, ECTFE
Motor
  • Standard type
    1 - 10,000rpm, clock-wise rotation, in case of Φ8" substrate, acceleration is 2,000rpm/s.
  • Heavy duty type
    1 - 10,000rpm, clock-wise and reverse clock-wise rotation, in case of Φ8" substrate, acceleration is 2,000rpm/s.
Selectable from above. For more information about motor types, please contact us.
Main Options
  • Linear drive chemicals delivered arm, chemicals delivery nozzle / line expansions, mega sonic cleaning.
  • Recirculation possible Chemical supply, ventilation system, high pressure jet, supplied chemical temperature control, spray nozzle to be attached on the back or central side ( for example, for edge bead removal etc.), various chuck (300 types such as vacuum, mechanical, backside protection etc.), Safety interlock.
* Compact and simple body design
* Customizable to customer’s specification.
For details about customizations, please ask.
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POLOS Chucks

Vacuum chuck
for small size substrates		 -Vacuum chuck for small size substrates Vacuum chuck for circular substrates
(Φ2" –Φ300")		 Vacuum chuck for circular substrates
Mechanical chuck -Mechanical chuck For circular substrate
(Vacuum chuck + centering pin)		 For circular substrate
Mechanical chuck
for squared substrates
(Mask, Crystal cells)		 Mechanical chuck for squared substrates Mechanical chuck for squared substrates
(Φ2", Φ3", Φ4")		 Mechanical chuck Mechanical chuck
Other vacuum chuck
for different substrates
shapes and sizes		 -Other vacuum chuck for different substrates shapes and sizes Other mechanical chucks
(Please ask for more information)		 -Other mechanical chucks
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Chemical Compatibility Chart

GREEN - Compatible / RED - Incompatible
Abbreviation Formula NPP PTFE
Acetic C2H2O2 Acetic Acid Acetic Acid
C3H6O Acetone Acetone
Alpha Terpineol C10H18O Alpha Terpineol Alpha Terpineol
NH4OH Ammonium Hydroxide Ammonium Hydroxide
C5H11Cl Amyl Chloride Amyl Chloride
Anisole C7H8O Methoxybenzene Methoxybenzene
C6H6 Benzene Benzene
Br *Bromine *Bromine
C5H5Cl Chlorobenzene Chlorobenzene
Malonic Acid CHC13 Chloroform Chloroform
DEC C5H10O Diethyl Keytone Diethyl Keytone
C11H20O4 Diethyl Malonate Diethyl Malonate
C2H6O2 Ethylene Glycol Ethylene Glycol
C6H12 Cyclohexane Cyclohexane
C6H10O Cyclohexanone Cyclohexanone
F2 Fluorine Fluorine (call)
HMDS C6H19NSi2 Hexamethyldisilazane Hexamethyldisilazane
C6H14 Hexane Hexane
HBr *Hydrobromic Acid *Hydrobromic Acid
HCI *Hydrochloric Acid *Hydrochloric Acid
HF *Hydrofluoric Acid *Hydrofluoric Acid
Peroxide H2O2 Hydrogen Peroxide Hydrogen Peroxide
I2 Iodine Iodine
IPA C3H8O Isopropyl Alcohol Isopropyl Alcohol
Mesitylene C9H12 Trimethylbenzene Trimethylbenzene
Ozone in DI O3 & DI H2O Ozone in DI water Ozone in DI water
Methanol CH4O Methyl Alcohol Methyl Alcohol
MEK C4H8O Methyl Ethyl Keytone Methyl Ethyl Keytone
CH2Cl2 Methylene Chloride Methylene Chloride
MIK C6H12O Methyl Isobutyl Ketone Methyl Isobutyl Ketone
NMP C5H9NO N-Methyl-2-Pyrrolidone N-Methyl-2-Pyrrolidone
Nitric HNO3 Nitric Acid (<50% concentration)
(>50% concentration)		 Nitric Acid
Phosphoric H3O4P Phosphoric Acid Phosphoric Acid
Resist Photoresist Photoresist
PMMA C5H8O2 Poly(methyl methacrylate) Poly(methyl methacrylate)
KOH Potassium Hydroxide Potassium Hydroxide
Sulfuric H2SO4 *Sulfuric Acid *Sulfuric Acid
THF C4H8O Tetrahydrofuran Tetrahydrofuran
C7H8 Toluene Toluene
TCA C2H3Cl3 Trichloroethane Trichloroethane
TCE C2HCI3 Trichloroethylene Trichloroethylene
Xylene C12H15N3O6 Xylene Xylene

* Choose all plastic hardware to avoid the corrosion of Stainless Steel components by this chemical.

Please be aware that this guide is known to be generally correct but intended only to be a reference for model selection.
Use at your own risk. Some chemicals, although compatible alone with the material, may be toxic or dangerous if mixed.
Continuous exothermic reactions may exceed the maximum operating temperature of the material.

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Usage Example

- Type Drying Rinse Cleaning Etching Coating
(manual)		 Coating
(Auto)		 Develop
-ment		 Substrate
size
Manual
Dispense
 SPIN150-NPP ◯ ◯ ◯ × ◯ N/A × Up to Φ150mm
or Φ4" × 4"
MCD200-NPP ◯ ◯ ◯ × ◯ N/A × Up to Φ200mm
or Φ6" × 6"
MCD200-PTFE ◯ ◯ ◯ ◯ ◯ N/A ◯
Automatic
Dispense
 ACD200-NPP ◯ ◯ ◯ × N/A ◯ ×
ACD200-PTFE ◯ ◯ ◯ ◯ N/A ◯ ◯
Manual
Dispense
 MCD300-NPP ◯ ◯ ◯ × ◯ N/A × Up to Φ300mm
MCD300-PTFE ◯ ◯ ◯ ◯ ◯ N/A ◯
Automatic
Dispense
 ACD300-NPP ◯ ◯ ◯ × N/A ◯ ×
ACD300-PTFE ◯ ◯ ◯ ◯ N/A ◯ ◯
Inquiry about Electronics/MEMS products and services
TEL)+81-044-852-7575 (Did)
FAX)+81-044-854-1979
KYODO INTERNATIONAL INC.
2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan
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KYODO INTERNATIONAL INC.
2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan
TEL)+81-044-852-7575 (Did)
FAX)+81-044-854-1979
Inquiry about Electronics/MEMS products and services
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