- KYODO INTERNATIONAL INC./Japan
- Electronics MEMS
- MEMS Total Solution
- MEMS Development Tools
- UV Exposure System for MEMS Line-up
UV Exposure System for MEMS Line-up
OAI is a company based in San Jose, California has been a leading company of “UV exposure” and “Optical measurement” precision system research & development and related service for 30 years.
Mask Aligner
| Model | Application | Type of Alignment | Substrate Size | Operating Mode |
|---|---|---|---|---|
| Model200 | R&D | Single side | up to Φ8" | Manual |
| Model500 | R&D | Single side | up to Φ8" | Semiautomatic |
| Model600 | R&D | Single side | up to 20"×20" | Manual |
| Model200IR | R&D | IR Both Sides (OPT.) | up to Φ8" | Manual |
| Model800MBA | R&D | Optical Both Sides (OPT.) | up to Φ8" | Automatic |
| Model5000 | R&D/Production | Single side | up to Φ12" | Automatic |
| Model8000 | R&D/Production | Optical Both Sides (OPT.) | up to Φ12" | Automatic |
| Model2000 | Production | Single side | up to Φ8" | Automatic |
Mask Aligner model 200: Manual, Single side aligner
Model 200 table top mask aligner is a reasonable system intended for beginner users, such as universities, laboratories, or start-ups.
| Features | |
|---|---|
| Stage |
|
| Exposure Time |
|
| Substrate Size | =< Φ8", 7"×7" |
| Secondary Equipment |
|
| Light Source |
|
| Mask Size | =< 9"×9" |
| Size | 940H×788W×635D |
| Weight | 115kg |
- Compact and economic model with manual operation which is ideal for R&D applications!
- UV nanoimprint capability is available with optional water holder and chuck controller. Enable to achieve "minimum 17nm" line & space structure by nanoimprinting!
Mask Aligner model 800 MBA: Automatic, Double sides aligner
The model 800 MBA has a back-side manual alignment feature which consists on an optical system mounted on hard packages platform.
| Features | |
|---|---|
| Stage |
|
| Exposure Time |
|
| Substrate Size | =< Φ8" |
| Secondary Equipment |
|
| Resolution Degree |
|
| Mask Contact | (1) Proximity (2) Soft contact (3) Hard & vacuum contact |
| Mask Size | =< 9"×9" |
| Chuck Control | XYZ & Theta (Differential micrometer) |
| Both Side Alignment | dual CCTV microscope |
| Alignment Precision |
|
| Size | 1800H×1300W×820D |
| Weight | 450kg |
- High end model with double sides alignment in high precision and automatic manner!
- UV nanoimprint capability is available with optional wafer holder and chuck controller.
| Front side and IR backside Mask Aligner model 200IR Applications: R & D, Manual | Mask Aligner model 500 Applications: R & D, Semiautomatic |
|---|---|
Model 200 with added IR alignment capability for backside. |
Model 500 series mask aligners are intended for numerous applications with variety of features. This model performs best in cutting-edge R&D and microfluidics fabrication (CLiPP). |
| Mask Aligner model 600 Applications: For large size substrates, Manual type | Mask Aligner model 5000 Applications: R & D to volume production, automatic |
Model 600 is a mask aligner and exposure system intended for large size format. It is suitable for processing of FPD and other large substrates (max. 20"×20"). |
Model 5000 is a fully automatic computer controlled mask aligner. Proximity contact exposure is possible. The model is suitable for cutting-edge R&D and volume production. |
| Mask Aligner model 8000 Applications: R & D, MEMS, and volume production, automatic | Edge Bead Exposure System model 2000 Applications: Dedicate to edge bead removal, Automatic |
|
Model 8000 is a fully automatic computer controlled mask aligner with optical back side proximity contact exposure capability. |
Model 2000 enables floodlighting exposure and edge bead exposure and is a fully automatic computer controlled system. It’s shadow mask technology makes production easy in case edge bead removal process is substantial. |
UV Light Sources
UV Light Source series 30: Stand alone type
The series 30 is a high efficiency light source aimed at various applications. It is possible to adjust the beam size by equips a number of lamps.
< OAI UV Light Sources principle >
| Lens diameter ( in inches) | 5" | 7" | 10" | 12" | 14" | 16" | - | - | - | - | |
|---|---|---|---|---|---|---|---|---|---|---|---|
| Exposure beam size ( in inches) |
dia. | 4" | 6" | 8" | 10" | 12" | 14" | - | - | - | - |
| angle | - | 4" | 6" | 8" | 10" | 12" | 14" | 16" | 18" | 20" | |
| Uniformity (inside diameter) | ±5% | ±5% | ±5% | ±5% | ±5% | ±5% | ±6% | ±6% | ±6% | ±6% | |
| Collimation (1/2 angle) | 2.6 | 2.3 | 2 | 1.6 | 1.4 | 1.2 | 1 | 0.8 | 0.6 | 0.4 | |
| Spectrum | Near UV | 365nm, 405nm, 436nm | |||||||||
| Mid UV | 310nm | ||||||||||
| Deep UV | 210nm, 260nm | ||||||||||
| Lamp power | 200W, 350W, 500W, 1000W, 2000W 3.5KW, 5KW : special wattage orders possible |
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- Wide range of products with various wave length (Near UV, Mid UV, and Deep UV).
- Large area up to 20"×20"
- Can be mounted on other manufactures’ machines. (For details, please contact us)
| Light Source for Large Areas | |
|---|---|
The light source grand (LSG) series is aimed at large size substrates and optimized for parallel mirror technologies. The LSG series can be extended for use of up to 12kw light sources and for areas up to 20"×20". |
UV Meters and Probes
OAI has a solid reliability for its instrumentation. We offer digital measurement systems with calibration capability. OAI meters are designed for monitoring of UV calibration system in applications such as photolithography, UV stabilizing system, adhesive and other material.
MEMS Total Solution
MEMS Prototyping
MEMS Volume Production
Microfluidic Chip
MEMS Development Tools
TEL)+81-044-852-7575 (Did)
FAX)+81-044-854-1979
KYODO INTERNATIONAL INC.
2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan
FAX)+81-044-854-1979
2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan
