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  5. All plastic versatile Spin processor

All plastic versatile Spin processor

mems IC" pv Bio NIL
sps logo

"POLOS™" manufactured by SPS is a spin processor with all plastic design, brushless motor equipped and many options and expandability available.

The versatile, all plastic, POLOS™ and SPIN150™ single substrate spin processors are specifically designed for applications for MEMS, R&D and typically low volume applications. Spin developing, spin etching, rinse / cleaning, spin drying

Benefits

  • All plastic versatile Spin processorFull plastic systems;
    • Easy to use = It can be easily cleaned.
    • Can be used for multiple processes: etching, development, spin-dry, etc.
    • Chemical inert (Polypropylene, Teflon).
  • Use of brushless motor
    • Rotation of heavy substrates works flawlessly.
    • Acceleration/ Backwards rotation/ no rotation values settable.
    • Rotation speed up to 10000rpm. Coating with high viscosity material also possible
  • Many options and expandability available
    • availableSubstrate dimensions from chip size up to 1000×1000mm can be handled.
    • Various line-ups of choices for many applications
      * Dispense type: manual / automatic
      * Desktop type / OEM type
      * All inclusive system "Mini Wet Station"
    • Wide choice available for fixing the substrate (ex. Vacuum chuck, Mechanical chuck, etc.)
    • Many customizations available for pumps, tanks, feed back systems for external apparatus, etc.

All plastic versatile Spin processor POLOS Line-up

Manual
  Model Spin150i Spin150i
-INT
Spin200i Spin200i
-INT
Specifications Type Desktop Built-in Desktop Built-in
Description Basic model
  • 3 output connecters (i.e.: Dispense unit, N2 diffuser etc.)
  • Output connecter enables to be used as an Automatic dispense
Substrate and Size Up to φ160mm (or 6”) or 4”x4” Up to φ260mm (or 8”) or 6”x6”
Applications Dry
Rinse
Cleaning
Etching
Development
Coating Manual
Automatic - - - -
Automatic
  Model POLOS200i
-ADV
POLOS200i
-ADV-INT
POLOS300i
-ADV
POLOS300i
-ADV-INT
Specifications Type Desktop Built-in Desktop Built-in
Description

Advanced model

  • Infinite I/O control by LAN connection
  • High torque robust motors for heavy substrates or high speed
  • System integrated solutions available on request
Substrate and Size Up to φ160mm (or 6”) or 4”x4” Up to φ260mm (or 8”) or 6”x6”
Applications Dry
Rinse
Cleaning
Etching
Development
Coating Manual - - - -
Automatic

* Up to 1000mm square substrates can be applied as an option

All plastic versatile Spin processor POLOS common characteristics

Chamber Material
  • NPP (Standard) or PTFE (Optional)

A seamless chamber structure by chemical-resistant polypropylene (Teflon as an option). Easy to clean.

Control Panel
  • Touch panel operation. Detachable

Operable with glove. Suitable for use in glove box.

Program
  • Unlimited programs and storage capacity*
  • Minimum step time ±0.1sec.
External PC is unnecessary
* USB, PC software etc. are possible by adding standard unit.
Data Port
  • USB
Included Substrate Holder
  • Standard Vacuum Chuck
  • Small adapter forφ 1/2“- φ 2’’
    (Various holders are available optionally)
Rotating Speed
  • Up to 12000rpm (150 or 200 series)
  • Up to 10000rpm (300 series)

Clockwise, Anticlockwise, Paddle action

Acceleration
  • 0-3000 rpm/sec
Rotating Accuracy
  • ±1rpm
Power Supply
  • 100–120VAC, 50/60Hz, 2.5A
Power Consumption
  • 500W (max)

All included system "Mini Wet Station"

POLOS Mini Wet Station (MWS)

POLOS Mini Wet Station (MWS)
Changes of specifications without previous notices possible.

By integrating Spin processor and high accuracy chemicals supply system in one body, it is possible to set up multiple processes in a single program. Chemical sharing system, liquid disposal system and ventilation system are mounted in a cabinet with sensor-monitored alarm system, guarantees safety in operation. Spin processor applies materials (PP, PTFE, etc.) which offer the same superior chemical inertness as other models.

Feature
Substrate Φ300mm mm model (Can handle substrate up to Φ260mm)
Φ400mm model (Can handle substrate up to Φ360mm)
Customized Spin Processor can handle substrates up to 600mm×600mm.
Chamber Materials PP, PTFE (TFM1600), PFA, ECTFE
Motor
  • Standard type
    1 - 10,000rpm, clock-wise rotation, in case of φ8" substrate, acceleration is 2,000rpm/s.
  • Heavy duty type
    1 - 10,000rpm, clock-wise and reverse clock-wise rotation, in case of Φ8" substrate, acceleration is 2,000rpm/s.
Selectable from above. For more information about motor types, please contact us
Main Option
  • Linear drive chemicals delivered arm, chemicals delivery nozzle / line expansions, mega sonic cleaning.
  • Recirculation possible Chemical supply, ventilation system, high pressure jet, supplied chemical temperature control, spray nozzle to be attached on the back or central side ( for example, for edge bead removal etc.), various chuck (300 types such as vacuum, mechanical, backside protection etc.), Safety interlock.

* Up to 1000mm square substrates can be applied as an option

POLOS Chucks

Vacuum chuck for
small size substrates
for small size substrates Vacuum chuck for
circular substrates
(Φ2" –Φ300")
for circular substrates
Mechanical chuck Mechanical chuck For circular substrate
(Vacuum chuck + centering pin)
For circular substrate
Mechanical chuck for
squared substrates
(Mask, Crystal cells)
For squared substrates Mechanical chuck for
squared substrates
(Φ2", Φ3", Φ4")
For squared substrates
Other vacuum chucks for
different substrates shapes
and sizes
Other vacuum chuck Other mechanical chucks
(Please ask for more information)
Other mechanical chucks

Chemical Compatibility Chart

[ Reference Information ]
Chamber material :NPP(Natural Poly Propylene)as a standard or PTFE as an option ◯:Usable -:Unusable ▲:Ask before use as it may cause destruction depend on conditions
Acetic acid Formula NPP PTFE
Acetic acid C2H2O2
Acetone C3H6O
α-terpineol C10H18O
Ammonium hydroxide NH4OH
Amyl chloride C5H11Cl -
Methoxybenzene C7H8O
Benzene C6H6 -
Bromine Br -
Chlorobenzene C6H5OI
Chloroform CHCl3
Diethyl ketone C5H10O
Dimethyl malonate C11H20O4
Ethylene glycol C2H6O2
Cyclohexane C6H12 -
Cyclohexanone C6H10O -
Fluorine F2 - -
Hexamethyldisilazane C6H19NSi2
Hexane C6H14
Oxalic acid HBr
Hydrochloric acid HCI
Hydrofluoric acid HF
Hydrogen peroxide solution H2O2
Iodine I2
Isopropyl alcohol (IPA) C3H8O
Trimethylbenzene C9H12
Ozone water O3 & H2O
Methanol CH4O
Methyl ethyl ketone (MEK) C4H8O
Methylene chloride CH2CI2
Methyl isobutyl ketone (MIK) C6H12O
N-Methyl-2-Pyrolidone (NMP) C5H9NO3
Nitric acid HNO3
Phosphoric acid H3O4P
Photoresist
Polymethylmethacrylate (PMMA) C5H8O2
Potassium hydrate KOH
Sulfuric acid H2SO4
Tetra hydro furane (THF) C4H8O
Toluene C7H8
Trichloroethane (TCA) C2H3CI3
Trichlorethylene (TCE) C2HCI3
Xylene C12H15O6
Related product

Desktop Hotplate

Desktop Hotplate

A precision hotplate which is suitable for pre-bake and post-bake. Table top size. Customizable. Manufactured by SPS

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Inquiry about Electronics/MEMS products and services
TEL)+81-044-852-7575 (Did)
FAX)+81-044-854-1979
KYODO INTERNATIONAL INC.
2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan
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KYODO INTERNATIONAL INC.
2-10-9 Miyazaki,
Miyamae-ku, Kawasaki-shi,
Kanagawa-ken, 216-0033,
Japan
TEL)+81-044-852-7575 (Did)
FAX)+81-044-854-1979
Inquiry about Electronics/MEMS products and services
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